Heidelberg Instruments announced
the sale of an advanced DWL 66FS maskless laser lithography system to the Regensburg
University of Applied Sciences, Regensburg, Germany.
The DWL 66FS maskless lithography system is capable of binary and gray scale
exposure, layer to layer alignment, and is able to produce sub micron features.
“The new laboratory for microsystems technology at the Regensburg University
of Applied Sciences includes a 100 m² clean room, which is utilized in
part by the group for micro sensor technology. The clean room is used for educational
purposes as well as a variety of research and development projects in the field
of sensor technology and analytics. These applications require not only state
of the art photomasks but there is also an increasing demand for 3-dimensional
surface structures. These structures could not be realized with the existing
equipment and the new Heidelberg Instruments laser lithography system will now
enable us to close this gap.” states Prof. Dr. R. Schreiner, head of the
laboratory for micro sensor technology.