Nova Measuring Instruments
Ltd. (NASDAQ: NVMI) provider of leading edge stand-alone metrology and the
market leader of integrated metrology solutions to the semiconductor process
control market, today announced that a major foundry in Asia Pacific has decided
to deploy its NovaScan Integrated Metrology (IM) solution coupled with NovaMARS(R)
shape profiling software, for 45nm gate Etch Advanced Process Control. The company
expects additional tools to be ordered and installed during 2010 from this particular
foundry.
"Foundries continuously deal with a large variety of products, combined
with an ever increasing need to tighten process control and reduce process variability,"
commented Noam Shintel, Director of Corporate Marketing at Nova. "Our leading
Integrated Metrology platform enables fast and accurate closed-loop control
of the Etcher, resulting in higher yield and improved productivity for our customers.
Expanding our product reach into more areas of the fab through a broadened product
offering has become part of our strategy and we expect this trend to continue
into the future".
The NovaScan integrated metrology platform is available in conjunction with
Applied Materials, Lam Research and Ebara Corporation CMP and Etch tools. The
platform provides a state-of-the-art metrology solution, implementing polarized
normal incidence spectroscopic scatterometry with an extended UV and IR spectral
range. NovaScan Integrated Metrology, featuring the highest fleet (tool-to-tool)
matching and throughput, is an ideal and cost-effective metrology solution for
the most demanding 2D, 3D, and in-die film thickness, Optical CD and shape profiling
applications.
Nova Measuring Instruments Ltd. develops, produces and markets advanced integrated
and stand alone metrology solutions for the semiconductor manufacturing industry.
Nova is traded on the NASDAQ & TASE under the symbol NVMI.