Novellus Systems (NASDAQ:
NVLS), IBM Corporation (NYSE: IBM) and the College of Nanoscale Science
and Engineering (CNSE) today announced the establishment of a strategic partnership
at CNSE's Albany NanoTech Complex targeting the development of semiconductor
process solutions for 22nm and beyond nanoelectronics technologies.
The most advanced semiconductors in volume production today have 45 and 32nm
circuitry, with devices at 28nm and below under development. The move to each
technology generation can result in smaller, faster, more efficient chips that
improve the performance of products ranging from servers to smartphones. Novellus
joins the ecosystem of semiconductor companies at CNSE's Albany NanoTech Complex
that are working with IBM, its technology alliance partners, and CNSE research
teams to address the challenges of moving to each technology generation.
The first project under this agreement is designed to enable advanced, residue-free
photoresist strip technologies for leading-edge processes for the 28nm and 22nm
nodes. Photoresist stripping is a critical process step for defining the wiring
in a semiconductor chip. The scope of the collaboration will encompass a range
of photoresist removal processes, including high-dose implant strip (HDIS) processes
that are compatible with high-k metal gate technology, and damage-free etch
strip chemistry used for ultra-low-k dielectric structures.
IBM brings to the collaboration extensive semiconductor technology experience
and a proven track record of technology development and manufacturing that can
help accelerate development of 28nm and smaller technology dimensions. Novellus'
GxT advanced photoresist strip platform will be used at IBM's East Fishkill
facility and CNSE's Albany NanoTech Complex for these new, sophisticated strip
applications. Novellus has demonstrated industry-leading cleaning results on
the GxT platform using specialized, non-oxidizing strip chemistries that can
achieve a silicon and oxide loss of less than 0.1nm. CNSE provides world-class
intellectual capital and unparalleled technological infrastructure at its Albany
NanoTech Complex, the most advanced in the academic world.
"IBM is committed to working with Novellus Systems and the College of
Nanoscale Science and Engineering in this newly-established technology collaboration,
where our initial focus is on optimizing these advanced photoresist strip technologies
for our industry-leading high-k metal gate transistor structures," said
Paul Farrar, vice president of process development, IBM. "Close collaboration
with equipment suppliers through the consortium of world-class companies at
CNSE's Albany NanoTech is critical to bringing leading-edge technology to market
for the benefit of IBM and its alliance partners."
"IBM has a long-standing reputation for developing state-of-the-art semiconductor
manufacturing processes," said Tim Archer, Novellus' executive vice president
of worldwide sales, marketing, and customer satisfaction. "Novellus is
excited to be working with IBM and CNSE in this strategic partnership focused
on advancing the science of photoresist strip and clean."
"The UAlbany NanoCollege looks forward to working in partnership with
industry leaders Novellus Systems and IBM to accelerate the development and
deployment of innovative technologies that will support nanoelectronics manufacturing,"
said Richard Brilla, vice president for strategy, alliances and consortia for
CNSE. "This collaboration will enable the integration of leading-edge process
and equipment technologies to help address the critical needs of industry, further
demonstrating the technology leadership of IBM and its alliance partners."