Molecular Imprints,
Inc., the market and technology leader for nanopatterning systems and solutions,
today announced that it is upgrading its Imprio® 250 nanopatterning system,
installed at the Device Process Development Center of Toshiba's Corporate Research
and Development Center, to an Imprio 300. Molecular Imprints' Imprio 300 system
represents the highest resolution and lowest cost-of-ownership (CoO) patterning
solution for IC prototyping and process development. Built upon the Imprio 250
architecture, the Imprio 300 delivers significantly improved throughput rates,
overlay performance and automation capabilities. In addition, the ability of
the Imprio 300 to create dense, high-resolution structures makes it especially
well suited for advanced semiconductor applications.
"Molecular Imprints is dedicated to realize the full potential of our
Jet and Flash(TM) Imprint Lithography (J-FIL(TM)) technology for advanced semiconductor
applications," stated Mark Melliar-Smith, CEO of Molecular Imprints. "The
progress we are delivering in terms of tool resolution and cost of ownership
performance is evidence that imprint lithography has emerged as one of the candidates
for future production of semiconductor devices. In all of the key technical
categories from overlay control to defectivity levels, our imprint lithography
systems are meeting their benchmarks as we move to support volume production
with cutting-edge technology."
With improved overlay performance, a mix-and-match strategy with existing 193-nm
scanners has been demonstrated down to 20nm full field. Utilized in a mix-and-match
strategy, J-FIL's resolution and cost advantages can be deployed on specific
critical layers, while its use of commercially available photomasks, exposure
sources and resists makes for straightforward integration with the industry's
existing optical lithography infrastructure. Beyond being compatible with the
existing lithography infrastructure, J-FIL technology offers the promise of
extending lithography to 10nm and beyond.