Vistec Lithography, B.V. is pleased to announce today that it signed a strategic partnership agreement with the College of Optoelectronic Science and Engineering at the Huazhong University of Science and Technology in Wuhan, PR of China.
The Huazhong University of Science and Technology (HUST) - a national key university in China and Vistec Lithography - a leading supplier of electron-beam lithography systems will collaborate in research and education of nanolithography.
The core of that project is the Vistec EBPG5000pES electron-beam lithography system, which will enable the College of Optoelectronic Science and Engineering to enhance their research and education effectiveness for both their students and associated research partners. “With the new patterning system we are able to further strengthen our leading position in photonics and optoelectronics, which are the most powerful technologies of the 21st century”, stated Prof. Miao Xiangshui and Prof. Zhou Wenli.
The Vistec EBPG5000pES is a high-performance lithography tool based on reliable and well-proven system architecture. With its electron-optical column (TFE source) rated for acceleration voltages of 50 and 100kV, the system provides a spot size down to <2.2nm, thus allowing nano-lithography structures smaller than 8nm to be routinely generated. The system incorporates an interactive graphical user interface (GUI) that provides ease of use for diverse, multiuser, university type environments.
“We are very proud to have been selected as a partner by the Huazhong University, HUST’s broad scientific audience and research network is indeed impressive”, said Erwin Mueller, Managing Director Vistec Lithography, B.V.. “With the EBPG5000pES’s field-proven reliability in leading edge Universities and Research Institutes all over the world and based on the comprehensive experiences of the Vistec staff we are able to provide HUST a good basis to pursue their strategic research roadmap. We look forward to a further business expansion in China.”