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Veeco Receives Orders for Multiple TurboDisc GaN MOCVD Systems from Genesis Photonics

Published on April 26, 2010 at 8:29 PM

Veeco Instruments Inc. (Nasdaq: VECO), announced today that it has received orders for multiple TurboDisc(R) K465i(TM) gallium nitride (GaN) Metal Organic Chemical Vapor Deposition (MOCVD) Systems from Genesis Photonics Inc. (GPI), headquartered in Taiwan, during the first quarter of 2010. GPI will use the systems to increase capacity for the production of high brightness light emitting diodes (HB LEDs) being driven by applications such as backlighting, lighting, displays, and automotive applications.

David Chung, Chairman and CEO of GPI, commented, "We have been very pleased with the production proven performance of Veeco's MOCVD systems already installed in our manufacturing facility. They are helping us to achieve brightness higher than the industry average. It was natural for us to select the K465i MOCVD Systems for our increasing capacity demands."

Bill Miller, Ph.D., Senior Vice President, General Manager of Veeco's MOCVD Operations commented "The K465i gives GPI the technology to surpass their LED brightness roadmap objectives, and also provides the industry's lowest cost of ownership, high productivity and best-in-class yields."

With superior wavelength uniformity and excellent run-to-run repeatability, the production-proven K465i extends Veeco's lead in capital efficiency - the number of good wafers per day for each capital dollar - for high volume LED manufacturers. The K465i provides ease-of-tuning for fast process optimization on wafer sizes up to 8 inches and fast tool recovery time after maintenance.

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