Veeco
Instruments Inc. (Nasdaq: VECO), announced today that it has received orders
for multiple TurboDisc(R) K465i(TM) gallium nitride (GaN) Metal Organic Chemical
Vapor Deposition (MOCVD) Systems from Genesis Photonics Inc. (GPI), headquartered
in Taiwan, during the first quarter of 2010. GPI will use the systems to increase
capacity for the production of high brightness light emitting diodes (HB LEDs)
being driven by applications such as backlighting, lighting, displays, and automotive
applications.
David Chung, Chairman and CEO of GPI, commented, "We have been very pleased
with the production proven performance of Veeco's MOCVD systems already installed
in our manufacturing facility. They are helping us to achieve brightness higher
than the industry average. It was natural for us to select the K465i MOCVD Systems
for our increasing capacity demands."
Bill Miller, Ph.D., Senior Vice President, General Manager of Veeco's MOCVD
Operations commented "The K465i gives GPI the technology to surpass their
LED brightness roadmap objectives, and also provides the industry's lowest cost
of ownership, high productivity and best-in-class yields."
With superior wavelength uniformity and excellent run-to-run repeatability,
the production-proven K465i extends Veeco's lead in capital efficiency - the
number of good wafers per day for each capital dollar - for high volume LED
manufacturers. The K465i provides ease-of-tuning for fast process optimization
on wafer sizes up to 8 inches and fast tool recovery time after maintenance.