Raith GmbH a leading provider
of Nano-Structuring and Lithography systems, announced today the installation
of a novel solution based on Raith's successful e-Line Electron Beam Lithography
systems and their new Nano-FIB ion source and focused ion optics, at The Center
for Nanoscience and Nanotechnology, Tel Aviv University, Israel. TAU will use
the new ionLiNE - ion beam lithography system (IBL) to develop and extend its
existing EBL facilities for advanced nano-prototyping applications.
'EBL has been the benchmark for Nano-prototyping research for many years -
combining speed with the established resist based nano-fabrication processing
required for advanced research. By adding the complimentary technique of ion
beam lithography, we will be able to extend the capabilities of our lithography
process beyond the conventional limits, and investigate novel processes, giving
higher levels of performance, both with and without the use of resist. The TAU
Center for Nanoscience and Nanotechnology serves many collaborative partners
within the University and external to it.
IBL is the natural compliment to EBL, adding automated three dimensional patterning,
but while utilising all the standard design tools and layer patterning processes
that are well understood for EBL. In addition to the delivery of one of the
first ionLiNE IBL instruments, TAU and Raith have signed a joint development
agreement to develop new IBL protocols for nano-prototyping applications for
this emerging technique.' said Ori Cheshnovsky, head of the The Center
for Nanoscience and Nanotechnology at TAU.
' This is the first time that applications which do not require ion beam
imaging as the first step, such as small wafer level patterning, automated nanometer
precision pattern placement and large area pattern stitching, which are effectively
unknown within the conventional ion beam community, may be routinely performed.
IBL solves these problems by applying true and tested, write field stitching
capabilities, made possible by laser interferometer stage technology, to the
versatile and direct write technique of ion beam patterning' said Lloyd
Peto - Senior sales manager for ion beam lithography at Raith GmbH.