Oxford
Instruments Plasma Technology (OIPT), leader in systems for etch, deposition
and growth, has recently received a multi-system order from the University of
Waterloo, Ontario, Canada for installation in their new cleanroom facility.
The process tools ordered are OIPT's System100 ICP + System133 PECVD,
and a FlexAL PECVD/ALD Cluster tool, with multi-wafer batch capability and the
potential for providing a number of process applications.
OIPT tools offer powerful stand alone and clusterable process modules, enabling
a wide range of
applications, and the University of Waterloo will be implementing the systems
for multiple process
techniques. These include Bosch, Cryo silicon etch, Compound Semiconductor,
Metal etch, PECVD. In
addition, one of the tools will be clustered to offer ALD process capability,
to deposit Al2O3 conformal
coating.
OIPT's System100 ICP Tool
The equipment will be housed in the cleanroom at the Mike and Ophelia Lazaridis
Quantum-Nano Centre, a
new state-of-the-art building now under construction at the heart of the University
of Waterloo campus. The
facility, slated for completion in 2011, will be shared between the Institute
for Quantum Computing and the
Waterloo Institute of Nanotechnology.
The purchase of equipment is made possible by the generous support IQC receives
from the Canada
Foundation for Innovation, the Ontario Research Fund, the University of Waterloo,
and the namesakes of the
new building, Mike and Ophelia Lazaridis.
Oxford Instruments pursues responsible development and deeper understanding
of the world through
science and technology, and this order for another new University research facility
is testament to that
commitment