SUSS Launches New Dedicated Lithography Solution for HB-LED Production

Published on June 9, 2010 at 5:39 AM

SUSS MicroTec (FWB:SMH)(GER:SMH), a leading supplier of equipment and process solutions for the semiconductor industry and related markets, today introduced the next generation of its MA100e mask aligner, a dedicated lithography solution for manufacturing high-brightness light emitting diodes (HB-LEDs).

Based on SUSS MicroTec’s production proven mask aligner design the automatic MA100e Gen2 processes wafers up to 4 inches and enables an industry leading throughput of 145 wafers per hour with reduced cycle times.

Next Generation of SUSS Mask Aligner MA100e.

LED equipment manufacturers will need to support the significant growth of LED production that is driven by the exploding demand for LED backlighting for televisions, monitors and other systems. With the MA100e Gen2 SUSS MicroTec has designed a highly competitive automatic mask aligner solution that meets the cost-sensitive technology requirements of the LED industry. High-intensity exposure optics and pre-alignment options shorten precious process time while functionalities like proximity exposure for high resolution down to 2.5 µm maximize yield and cost-efficiency. The MA100e Gen2 provides exceptional process scalability and fast time-to-market for new device designs.

“We have clearly noted the growing demand for sophisticated HB-LED technology and see the trend towards lower cost of ownership resulting from higher automation in the LED industry”, noted Frank Averdung, President and CEO of SUSS MicroTec. ”With the next generation of the MA100e SUSS MicroTec has developed a highly efficient automatic mask aligner solution for LED production that helps our customers to cut down cost per lumen and increase their production efficiency.”

Source: http://www.suss.com/

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