Cambridge NanoTech, the world leader in Atomic Layer Deposition (ALD) science and equipment, today announced that they have partnered with Stanford University's Center for Integrated Systems (CIS), a partnership between academia and industry that supports leading edge research into semiconductor and advanced electronics. In addition, Stanford University is now outfitted with five Cambridge NanoTech ALD systems.
"Cambridge NanoTech is honored to collaborate with Stanford on developing world-class research and real-world applications," said Ganesh Sundaram, Cambridge NanoTech VP of Technology. "We are excited to bring together forward-thinking researchers with access to all the resources and support needed to advance ALD research to the next level."
Stanford has three Cambridge NanoTech Savannah thermal ALD systems installed and most recently acquired a Fiji F202 dual chamber plasma ALD system. The latest Savannah and Fiji systems are being used in the Stanford Nanofabrication Facility (SNF) to fabricate ultra-thin nanomechanical switches. Researchers also have been using the Savannah to explore materials with electrical properties and low surface energies such as Titanium Nitride and Tungsten.
"Stanford was our first Savannah customer in 2004," said Jill Becker, Founder of Cambridge NanoTech. "I'm very pleased to have worked so closely with them the last several years and to further develop our relationship by joining the cutting-edge research efforts at CIS."
Cambridge NanoTech's Fiji F202 plasma ALD system at the SNF will be used to grow oxide and nitride films in one of the Fiji chambers and the second Fiji chamber will be available for more exotic possibilities such as working with gold, nanotubes, and graphene.
As one of the 14 National Nanotechnology Infrastructure Network (NNIN) sites, the SNF offers extensive support in nanoscale fabrication, synthesis, characterization, modeling, design, computation and training in an open, hands-on environment, available to all qualified users. Cambridge NanoTech currently has ALD tools installed in nearly half of all NNIN sites.
Cambridge NanoTech will be attending the ALD 2010 conference in Seoul, South Korea during the week of June 22, where our scientists will present ALD research on process optimization of low vapor pressure precursors and growth of low resistivity TiN from metal-organic precursors.