Cambridge NanoTech, the world leader in Atomic Layer Deposition (ALD) science and equipment, today announced the delivery of its 200th ALD system. Cambridge NanoTech attributes this milestone to an increasingly widespread acceptance of this technology and the unique qualities that the company brings to the ALD community.
Roger Coutu, VP of Engineering at Cambridge NanoTech, recognizes the significance of this milestone: "This indicates two points. Firstly, there has been a general market acceptance of this technology, and secondly, this validates our belief that the technology will be more accessible, affordable, and ubiquitous through designs that are less complex."
Ray Ritter, COO of Cambridge NanoTech, is pleased to note that the company now has ALD systems being used in a multitude of applications installed on five continents. "The main mission of Cambridge NanoTech is to produce a wide range of ALD systems for scientific research and manufacturing," said Mr. Ritter.
Cambridge NanoTech is dedicated to continuing to be the provider of choice for next-generation ALD products. The company's plans for future ALD projects include developing FAST ALD and roll-to-roll ALD systems for use in the rapid deposition of flexible and rigid large area substrates. "Our larger research and production ALD systems have been well received in the market, following in the footsteps of our highly successful Savannah ALD system," said Mr. Ritter.
Cambridge NanoTech is currently attending the ALD 2010 conference in Seoul, South Korea, where our scientists are presenting ALD research on process optimization of low vapor pressure precursors and growth of low resistivity TiN from metal-organic precursors.