Carl
Zeiss introduces its PROVE™ Registration and Overlay Metrology System
for photomasks at SPIE Photomask Conference in Monterey / CA. PROVE™ measures
image placement on photomasks with superior resolution meeting the challenging
requirements of the 32nm technology node and beyond.
Further extension of 193nm lithography to the next technology nodes by introducing
strong optical proximity corrections and double patterning requires new approaches
for photomask registration and overlay metrology.
New PROVE Photomask Registration and Overlay Metrology System
With its diffraction limited, high resolution imaging optic working at the
lithographic relevant 193nm wavelength the new PROVE™ system opens up
entirely new perspectives in registration metrology. PROVE™ allows for
measurement of the smallest production features without placing registration
marks. “This real in-die registration metrology is a huge benefit for
our customers in Mask Manufacturing. For the first time in history, mask makers
are able to measure and analyse registration where it really matters. Additionally,
with increasing resolution demands e.g. for EUV lithography, we can extend our
tool capabilities to the upcoming technology nodes.” explains Dr. Oliver
Kienzle, Managing Director of Semiconductor Metrology Systems Division of Carl
Zeiss SMT.
The proprietary autofocus and calibration strategy of the new system enables
a repeatability of below 0.5nm and an accuracy of below 1nm for best registration
measurement performance.
Even in manufacturing of mask writers the PROVE™ system is used to tune
the pattern generators to improve pattern placement results and to minimize
registration errors on photomasks. Recently Carl Zeiss reported about the shipment
of the first tool to NuFlare Technology Inc., the worlds leading supplier of
e-beam based mask writers.
The next system to a Mask Shop customer will be delivered at the end of this
month.
Posted September 13th, 2010