Site Sponsors
  • Park Systems - Manufacturer of a complete range of AFM solutions
  • Strem Chemicals - Nanomaterials for R&D
  • Oxford Instruments Nanoanalysis - X-Max Large Area Analytical EDS SDD

Nanometrics Unveils Turnkey Overlay Metrology Solution for Advanced IC Manufacturing

Published on March 1, 2011 at 1:53 AM

Nanometrics Incorporated (Nasdaq:NANO), a leading provider of advanced process control metrology, today announced the launch and delivery to a leading Asian memory customer of the Mosaic™ II, its newest turnkey image-based overlay metrology solution for advanced high-volume IC manufacturing.

“Nanometrics has shipped over 500 overlay metrology systems, beginning with its first tool twenty-five years ago, and has been a leading provider of overlay metrology systems from technology nodes of over 1 micron to the current 2x nm applications. With the launch of the Mosaic II, Nanometrics extends its role as an innovator in the field of overlay metrology, supporting advanced lithography process control, including double patterning processes used on today’s most advanced devices,” commented David Doyle, vice president and business unit manager of Nanometrics. “We continue to strengthen our product offerings in this important market with a major Asian customer selecting the Mosaic II system for production line monitoring of their most challenging devices.”

The Mosaic II is the latest overlay metrology system in a series of products designed as part of Nanometrics’ Lynx™ cluster metrology platform. Combining Mosaic II with IMPULSE® modules onto a Lynx metrology cluster, we offer our customers a more complete solution for advanced lithography control. This configuration would enable image-based overlay, diffraction-based overlay (DBO) and optical critical dimension (OCD) measurements, providing the lowest cost of ownership in the industry for lithography process control metrology. Earlier generation Caliper Mosaic tools can be field upgraded to Mosaic II capability, offering Nanometrics’ customers the most cost-effective path to leading edge performance.

To learn more about the Mosaic II, Lynx cluster metrology, and Nanometrics process control metrology solutions, visit Nanometrics at SPIE Advanced Lithography, San Jose Convention Center, March 1st-2nd.

Source: http://www.nanometrics.com/

Tell Us What You Think

Do you have a review, update or anything you would like to add to this news story?

Leave your feedback
Submit