Mar 9 2011
Nanometrics Incorporated (Nasdaq: NANO), a leading provider of advanced process control metrology systems, today announced that a leading Japanese semiconductor company has selected its IMPULSE integrated metrology (IM) solution for process control of advanced chemical mechanical polishing (CMP) applications to be deployed as part of its new fab build-out.
The selection expands on the recent order by the same customer for Nanometrics' Lynx cluster metrology platform equipped with IMPULSE systems, which was selected for in-line optical critical dimension (OCD) control of etch and lithography applications.
"The IMPULSE system was selected for its superior measurement performance, reliability and speed. This selection is further evidence of the competitive gains we are making by working closely with industry-leading device manufacturers to align our product roadmaps to future technology requirements," commented Steve Bradley, Director of Nanometrics' Integrated Metrology Business Unit.
"The IMPULSE system is now qualified on the latest CMP platforms from the two leading suppliers of CMP systems, for both dielectric and metal polishing applications. Our integrated metrology solutions are utilized in leading logic, Flash, DRAM and foundry fabs, providing in-line metrology for lithography, etch, CMP and thin film deposition for device geometries from 65nm down to the 1x node."