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Posted in | Nanolithography

Direct Write Lithography Platform to Develop Prototype of Microfluidics Devices

Published on April 16, 2011 at 3:15 AM

By Cameron Chai

The µPG101 from Heidelberg Technologies is a user friendly and cost -effective micro pattern generator that is suitable for direct write applications and low volume mask making.

It is ideal for rapid sampling of two-dimensional and three-dimensional microstructures on substrates up to 4x4inches. It can reveal high resolution designs with features of one micron and also features an address grid measuring 40nm.

The platform has been installed in STMicroelectronics’ More Than Moore Research Labs located in Agrate Brianza to help create samples of microfluidics devices to be used in applications such as medical diagnostics and Lab-On-chip.

Heidelberg Instruments manufactures precision maskless lithography platforms. The systems are applicable in direct writing and photomask procedures by universities and industries in MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, and Micro Optics.

Source: http://www.st.com

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