Veeco Instruments Inc. (Nasdaq: VECO) announced today that Epistar Corporation, headquartered in Taiwan, has recently qualified the TurboDisc(R) MaxBright(TM) gallium nitride (GaN) Multi-Reactor Metal Organic Chemical Vapor Deposition (MOCVD) System for high-volume production of high brightness light emitting diodes (HB LEDs).
Ming Jiunn Jou, Ph.D., President of Epistar, commented, "Veeco's MaxBright Multi-Chamber System enables us to ramp production quickly on the industry's most productive platform. We will continue to rely on Veeco for technological innovation and process expertise as a strong strategic partner. Veeco's commitment to providing best-in-class MOCVD equipment, as well as enhanced local support with their new technology center in Hsinchu, will help Epistar to achieve our future expansion goals and success."
William J. Miller, Ph.D., Veeco's Executive Vice President, LED & Solar, commented, "The MaxBright system is the ideal solution for the lowest cost of ownership LED production, and we are pleased that Epistar, a clear leader in high quality LED manufacturing, has adopted the MaxBright for their production ramp. Our long-standing partnership is a key factor in the mass adoption of LEDs for general lighting."
The MaxBright system is the industry's most productive, lowest cost of ownership MOCVD system available to manufacture high brightness LEDs. Available in a 2 or 4-reactor cluster architecture, the MaxBright system delivers up to a 500% productivity gain and 2.5x increase in footprint efficiency over the industry-leading K465i system. For more information, please visit http://www.veeco.com/maxbright.