Posted in | Nanofabrication

Plasma Etch Inc. Release New Automated Plasma Cleaning System

Published on August 8, 2012 at 5:41 AM

Plasma Etch, Inc. has just released the PE-25-jw. It has an incredibly low starting price of $6900 USD. Equipped with PLC control, the system comes with a single gas channel, and has the option of a second. It is fully automated. The system is the smallest of the Plasma Etch, Inc line of plasma cleaners, and holds true to the Plasma Etch, Inc reputation as being durable, reliable, and having consistent, repeatable results every time.

The system has automatic process sequencing capabilities. All timed events (pumpdown, plasma, gas stabilization and vent) can be easily programmed into the automatic sequence. The PLC keypad is used for operator entry and one complete process recipe can be store in memory for repeatable results. One button operation starts the process sequence. As in all Plasma Etch systems, direct RF contact (capacitive parallel plate) is used for uniform plasma generation. The unit has a 125W 50KHz RF power supply with continuously variable power capability. The unit has a 2.5" x 4" Horizontal "Direct Contact" RF powered electrode with 1.25" of chamber height clearance.

The PE-25-jw is comprised of components made in the USA and is built and supported from their Carson City, NV headquarters. Plasma Etch has 30 years of experience in plasma technology.

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