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Posted in | Nanoanalysis

Lot-QuantumDesign Announces Two New Stylus Profilers from KLA Tencor

Published on January 16, 2013 at 6:53 AM

LOT-QuantumDesign are pleased to announce the launch of the new P-7 and P-17 Stylus profilers from KLA Tencor.

The P-7 Long Scan Automated Stylus Profiler is a fabrication-class long scan stylus profiler with 1000 site mapping and closed-loop stylus force control.

The P-7 stylus profiler builds on the success of KLA-Tencor’s market-leading stylus profilers for the semiconductor, data storage, MEMS, solar, opto-electronics and general purpose markets. This mid-range platform brings together all the superior scanning features associated with the KLA-Tencor brand — programmable scan stage, low noise, and high quality, high resolution long scans — with the best price-to-performance capabilities available from any manufacturer.

Key Specifications:

  • Better than 4 Å step height repeatability with sub-angstrom vertical resolution
  • 150 mm scan length – no stitching required
  • 150 mm stage standard; 156 mm solar stage; 200 mm stage optional
  • Up to 1 mm Z-range for measuring steps from 5 nm to 1 mm

The P-17 Long Scan Advanced Automated Stylus Profiler is a fabrication-class long scan stylus profiler for substrates up to 300mm² with unrivalled automation options.

The P-17 stylus profiler is a surface metrology analysis solution used in a wide range of applications and industries, from R&D departments and universities to production and process monitoring. This surface analysis solution's precise force control provides excellent vertical resolution, precision, and reliability measurements. This surface analysis solution delivers automated step height analysis, surface contour, waviness and roughness measurements with detailed 2D or 3D analysis of topography for a variety of surfaces and materials.

Key Specifications:

  • Better than 4 Å step height repeatability with sub-angstrom vertical resolution
  • 200 mm stage is standard with 200 mm scan length – no stitching required
  • 300mm stage option
  • Up to 1 mm Z-range for measuring steps from 5 nm to 1 mm

Applications include:

  • Wafers
  • Thin films
  • MEMS
  • Data storage
  • Hard disks
  • Roughness
  • Radius of curvature
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