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Posted in | Microscopy | Nanofabrication

Multiple Ion Beam Microscopy For Advanced Nanofabrication Discussed In Webinar

Published on February 15, 2013 at 6:27 AM

The strive for decreasing feature sizes in plasmonic research, lithography, semiconductor technology and materials development leads to a need for instruments that enable rapid prototyping of such structures and simultaneous high resolution imaging for process control.

The new gas-field ion-source technology (GFIS) offers the capability of combining atom-probe sized helium and neon ion beams (multiple ion beams) in one system for exactly these purposes.

By adding a gallium FIB column, the request for high ablation rates is also addressed and completes the nanofabrication length scale from micrometers to below 10 nanometers. The webinar explains the technology, presents first application results from leading research and applied science and gives an outlook on the potential of the technology.

During the webinar, Dr. David Joy, Distinguished Professor at the University of Tennessee, Knoxville, and Dr. Mike Phaneuf, President of Fibics Inc. (Canada), will give insights into their research work, using the ORION NanoFab multiple ion beam microscope from Carl Zeiss.

The webinar will be broadcasted live on Friday, February 15 at 3pm GMT | 4 pm CET | 10 am US eastern time and will be accessible via the webpage from Materials Today for several months. For registration click on this link: http://bit.ly/XQWAB4

About Carl Zeiss

The Microscopy business group at Carl Zeiss is the world's only manufacturer of both light and electron microscopes. The company's extensive portfolio enables research and routine applications in the life and materials sciences.

Their product range includes light and laser scanning microscopes, electron and ion microscopes and spectrometer modules. Users are supported for software for system control, image capture and editing.

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