Nanonex Corporation, the inventor of nanoimprint lithography and the world’s leading provider in nanoimprint lithography solutions with the longest history, is proud to sponsor the 2014 Cornell NanoScale Facility (CNF) Annual Meeting, and will host a nanoimprint application workshop during the event.
The 2014 CNF Annual Meeting, being held on Thursday, September 18th, is an excellent opportunity for the scientific community to learn about the exciting research carried out by CNF users over the past year. Nanonex Corporation will participate and sponsor the 2014 CNF Annual Meeting.
Nanonex Corporation is also hosting a Nanoimprint Process and NX-2500 Application workshop on Wednesday, September 17, 2014, prior to the CNF 2014 Annual Meeting. The objective of this workshop is to provide knowledge of nanoimprint processes and application trainings to the current and prospective users of the NX-2500. CNF scientists, professors, staff and students, as well as local high-tech company users, will participate and explore what NX-2500 can do for their research.
The Nanonex NX-2500 housed at CNF is a full wafer nanoimprintor with imprint alignment. It has up to 4 inches wafer patterning capability in all imprint forms: thermal, photo-curable and embossing with sub-5 nm imprinting resolution. It features sub-1 micron front side alignment accuracy. Based on the Nanonex unique patented Air Cushion PressTM technology, the NX-2500 offers unsurpassed uniformity regardless of backside topology, wafer or mask flatness, or backside contamination. This ACP technology also eliminates lateral shifting between the mask and substrate, and significantly increases mask lifetime. The small thermal mass design allows fast thermal cycling, resulting in a fast process cycle.