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Obducat Awarded Chinese Patent for Electron Beam Recording Technology

Published on February 7, 2007 at 2:14 PM

OBDUCAT AB, the world-leading supplier of lithography solutions based on Nano Imprint Lithography and E-beam lithography, is pleased to announce that a new patent have been granted. The Chinese Patent Office has issued a patent for a technology that concerns Obducat’s Electron Beam Recording (EBR) technology.

The patent is very important for the market position of Obducat especially within the application area hard disks.

The issued patent concerns an exposure strategy that enables a higher accuracy of the exposed patterns on stampers for next generation hard disk technology so called “pattern media”. The exposure strategy aims at minimising the errors that may impact the level of accuracy that can be achieved when producing the structures by evening out the errors by exposing the pattern more than once. This makes it possible to simplify the configuration of the EBR system and hence makes the overall solution more cost efficient.

The stampers that are produced with the EBR system are considered as consumables and are being used when replicating hard disk substrates in NIL systems.

Patrik Lundström, CEO Obducat, comments:

“ This is a very important patent that concerns above all the hard disk application area. The capability to produce pattern media structures with a high level of accuracy forms is vital part in enabling us to gain market share as a stamp manufacturer within the hard disk industry. Additionally the capability to produce this type of stampers also constitutes a pre-requisite for the implementation of nano imprint lithography (NIL) for production of pattern media hard disks. The fact that the patent is granted in a high potential marketplace is of great significance,” says CEO Patrik Lundström.

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