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JEOL, Genisys and Cornell University form Nanotechnology Development Partnership

Published on June 5, 2007 at 2:56 AM

GenISys GmbH, a provider of software for optimization of microstructure fabrication processes focusing on e-beam direct write, today announced it has formed a technology development partnership with JEOL, Ltd., and Cornell University’s Nanoscale Science and Technology Facility. Together, the three organizations are collaborating to develop advanced solutions for direct write e-beam data preparation and electron process correction (nano-EPC) technologies for nanometer-range structures.

In this partnership, each organization is leveraging its unique expertise and resources. Working with JEOL, GenISys is optimizing its high-performance Layout BEAMER data preparation and PEC software to maximize performance on the hardware vendor’s high-end e-beam lithography systems. As one of the world’s leading nanoscale research facilities, Cornell Nanoscale Science and Technology Facility is providing guidance on both implementation and development strategies, leveraging its work on nanostructures used in microelectronics, optics, biomedical applications and other functions.

Work on the three-party agreement has been in progress for about six months, with a focus on structures of some 10 nanometers or less. These extremely small structures are fabricated with only a few pulses of the electron beam writer, creating a need for unprecedented uniformity, consistency and placement. Findings of the Cornell-JEOL collaboration have already enabled upgrades of the GenISys software Layout BEAMER, which now includes an algorithm that corrects printing artifacts of this discrete writing grid. Future versions will be able to account for additional machine and process effects. The GenISys nano-EPC solution represents a major advance over the 20-year-old software technology that has been used for e-beam data preparation and correction.

“The users of e-beam direct write need urgent solutions for advanced data preparation and correction for nanostructure applications. The strong cooperation of the equipment vendor, the user and the software vendor is key for these developments. We are very fortunate to be collaborating with JEOL and Cornell Nanoscale Science and Technology Facility,” said Ulrich Hofmann, founder and general manager of GenISys. “These organizations are pioneering the state of the art in nano-fabrication and provide the ideal forum for further development and extension of Layout BEAMER. The high flexibility, responsiveness and unique combination of software and e-beam application knowledge will enable GenISys to deliver the solutions the market is waiting for.”

“JEOL has always sought to provide the most flexible e-beam tools on the market, and the input we receive from the team at Cornell is a huge contribution to our development efforts. With GenISys as a partner, we will have more visibility into the data preparation side of nano-fabrication and will benefit from collaborating with their outstanding specialists,” said Katsuya Watanabe, sales manager of JEOL, speaking at the company’s User Group meeting held in conjunction with the International Conference on Electronic, Ion, and Photon Beam Technology and Nanofabrication in Denver, CO, on May 29 – June 1, 2007.

“Layout BEAMER has impressed us with its ease of use and overall quality of results. The fast development speed, responsiveness and flexibility of GenISys enable the implementation of new technologies we need to enhance our e-beam nano-structuring capabilities. We’re glad to have the chance to explore it further and apply it to our interdisciplinary development efforts,” said Rob Ilic, research associate and user program manager of Cornell Nanoscale Science and Technology Facility. “With more than 700 users coming to our facility annually, we do a vast amount of e-beam data preparation, and this collaboration will help us provide better service and results, as well as learn more about the future of the process.”

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