The Starlith® 1900i immersion lithography optical system from Carl Zeiss SMT is ready for serial production. More than 10 systems have already been qualified for integration into ASML’s TWINSCAN™ XT:1900i wafer scanners, the first of which has already been shipped to an end user. The combination of outstanding optical specifications - including numerical aperture, resolution, polarization control, and transmission - with the unrivalled scanner technology of ASML results in a market leading tool capable of meeting even the most demanding customer applications.
“The complete set of production equipment is installed, and the whole supply chain is organized to support the expected steep production ramp up,” said Dr. Andreas Dorsel, Member of the Board at Carl Zeiss SMT and Senior Vice President and General Manager of SMT´s Lithography Optics Division. “The Starlith® 1900i features the highest NA available in the market for immersion lithography, therefore offering the highest resolution at full image field. Since a numerical aperture of 1.35 is seen as the practical limit for water based immersion lithography, we expect a rather long life cycle for this product.”
The Starlith® 1900i lens is based on the proprietary “Catadioptric Inline Multi Mirror Design”, enabling a compact single barrel design. Since an even number of mirrors is used, there is no image flip, resulting in full mask compatibility with conventional refractive systems. The system enables volume chip production down to the 40 nm resolution, which has already been successfully demonstrated.