More than 30 scientific and technical papers based on
research conducted at the College of Nanoscale Science and Engineering
of the University at Albany will be presented at one of the
world's leading conferences focused on the global nanoelectronics
In all, 31 papers will be presented at the SPIE Advanced
Lithography conference in San Jose, CA that represent work performed at
CNSE's Albany NanoTech Complex either by CNSE research teams, by the
CNSE global corporate partners' research teams resident at Albany
NanoTech - including IBM, AMD, International SEMATECH, ASML, Tokyo
Electron and Applied Materials - or by joint CNSE and partners'
research teams resident at Albany NanoTech.
The papers cover a range of topics and outline innovative
research in lithography, which is seen as critical to the manufacturing
of future nanoelectronics devices. Included among the technical areas
in which new developments are reported are extreme ultraviolet ("EUV")
systems, resists and masks; immersion lithography materials and
processes; and, optical microlithography.
Dr. Alain E. Kaloyeros, Vice President and Chief
Administrative Officer of CNSE, said, "The presentation of more than 30
scientific and technical papers at the SPIE Advanced Lithography
conference based on research performed at CNSE's Albany NanoTech
Complex further demonstrates the world-class intellectual know-how and
unmatched technical capabilities at the UAlbany NanoCollege. The
recognized excellence of this truly unique resource for high-tech
education, research, development and commercialization is a tribute to
the vision, support and investment of New York's elected officials,
which have created a pioneering educational paradigm at CNSE and
accelerated technology development among the world's leading
Dr. James G. Ryan, Associate Vice President of Technology and
Professor of Nanoscience at CNSE, said, "The scientific and technical
papers generated at CNSE's Albany NanoTech by the NanoCollege and our
global corporate partners underscore the power of collaboration between
academia and industry in fostering innovation. We are confident that
the developments reported at SPIE will play an important role in the
effort to accelerate the introduction of extreme ultraviolet
lithography into manufacturing."
The SPIE conference, being held February 24-29, attracts
thousands of attendees and is considered the semiconductor lithography
industry's most important technical event.