Organic and inorganic contaminants of precision devices such
as flat panel displays, MEMS devices and patterned semiconductors are
often difficult to detect. Many contaminant materials are essentially
invisible to common analytical techniques such as optical microscopy.
CRAIC Technologies QDI 2010™ microspectrophotometer
CRAIC Technologies, Inc., a global
leader in application-focused microanalysis solutions, provides the
capability to both detect and analyze trace contaminants with a single
instrument. This is done by combining both ultraviolet microscopy with
ultraviolet microspectroscopy in the CRAIC Technologies QDI
2010™ microspectrophotometer equipped with the optional QDI
ImageUV™ package.
Many organic and inorganic materials absorb light in the
ultraviolet region but are invisible to the naked eye. This means that
standard optical microscopy will not be able to detect these
contaminants nor is it capable of analyzing them. While other
techniques are available, they require extensive sample preparation and
can damage the sample. By utilizing ultraviolet micro-imaging, the user
is able to quickly, easily and non-destructively locate many
contaminants. UV microspectroscopy can then be performed to measure the
electronic spectral characteristics of the contaminant in order to
identify it. The spectra can also be used to further improve the
clarity of the image of the contaminants by determining the wavelength
of maximum absorbance. By combining both techniques in the QDI
2010™ microspectrophotometer, the user is easily able to
locate and identify contaminant materials on flat panel displays,
semiconductor chips, MEMS and even microfluidic devices. The QDI
2010™ microspectrophotometer is the first system ever to
combine both UV microscopy and microspectroscopy in a single tool. It
can also be upgraded to enable ultraviolet, visible and near infrared
reflectance, transmittance and fluorescence microscopy and
microspectroscopy.