Asylum Research to Present Session on NanoIndenter System at AVS Conference

Published on October 16, 2008 at 11:11 AM

Asylum Research announced that it will present a session on its NanoIndenter System at the AVS Conference and Exhibition in Boston, MA on October 21 at 12:20 in the Exhibitor Workshop area of the main exhibit hall. Asylum Application Scientist, Keith Jones, will present "Combining AFM and Instrumented Nanoindentation for Mechanical Characterization of Materials at the Nanoscale."

Unlike other cantilever-based indenting systems, the Asylum NanoIndenter drives the indenting tip perpendicular to the sample under study and provides true quantitative measurements. Because the depth and force are computed based on displacements measured with AFM sensors, the NanoIndenter delivers unprecedented resolution. The NanoIndenter is also the only commercially-available instrumented system that allows high-voltage piezoresponse microscopy measurements (PFM). The NanoIndenter can operate under fluid and at temperatures up to 300C. Mr. Jones will discuss the NanoIndenter's technology, capabilities, and operation, including current application examples.

This free 20-minute workshop/presentation is available to all attendees of the Conference and no registration is required.

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