CVD Equipment Corporation
announced today that it has received orders totaling $25 million since the beginning
of the year - January 1, 2008, compared to $14 million of orders received for
the full 12 months of 2007. Approximately 50% of the orders in 2008 address
needs of the solar and energy markets and incorporate CVD proprietary and patent
pending thin film solutions for enabling tomorrow's technology(TM).
The first thin film market segment we are addressing is for continuous thin
film Atmospheric Pressure Chemical Vapor Deposition (APCVD) of Transparent Conductive
Oxide (TCO) coatings for Photovoltaics - solar energy and Low-E coatings - energy
efficient windows. The technologies we are offering will enable TCO and other
coatings to be done both Off-Line, i.e. after the float glass is cut to the
desired size and On-Line, i.e. on a Float Glass production line.
The second thin film market segment is a high throughput Silicon Epitaxial
Chemical Vapor Deposition System for a lower cost manufacturing solution in
the solar and power semiconductor markets. The ability to economically deposit
a quality silicon thin film onto a re-usable, inferior or non-silicon substrate
and thereby form the basis for a solar cell will significantly reduce overall
manufacturing costs and the need for high quality silicon substrates.
The large demand for energy savings, energy generation materials and products
needed to address rising energy costs creates a growing demand for manufacturing
solutions using thin film coatings on glass, wafers and other substrates. Using
our application laboratory we will perfect and expand the multiple areas where
these low cost thin film manufacturing solutions can be applied and further
optimize our proprietary and patent pending technologies for cost and performance.
The solar, energy and power semiconductor markets we are addressing with multiple
products have significant growth opportunities for technologies that deliver
favorable price benefits.