At the 14th International Conference on Thin Films (ICTF 14) in Belgium last
week LayTec has presented
the latest results of on-line deposition rate measurements in sputter processes.
Dr. Steffen Uredat of LayTec reported on the application for magnetic storage
systems and MRAM at SINGULUS Nano Deposition Technologies GmbH in Kahl, Germany.
Dr. Berthold Ocker and his team at SINGULUS use a LayTec sensor to monitor the
deposition rate of thick Al2O3 layers on Si for end-point detection in a newly
developed sputter chamber with 10 x 8" substrates. Like all other LayTec
products, the sensor also determines optical properties (R, n, k) and indicates
On-line deposition rate (red curve) and layer thickness (blue
curve) measurements during deposition of Al2O3 for end-point detection
of 30 ìm target thickness.
Dr. Uredat also presented results gained by monitoring of thin
SiO2-SiNx-layer stacks for antireflection coatings deposited on
glass by reactive sputtering at Fraunhofer Institute of Electron
Beam and Plasma Technology (FEP) in Dresden, Germany.
Unlike the commonly used quartz crystal monitors, LayTec's
in-situ sensors measure directly on the thin-film surface and
provide information about deposition rate and surface morphology
on-line. In contrast to transmittance measurements,
they are applicable for opaque substrates as well and need
only one view-port.
For further information or a copy of Dr. Uredat's presentation
please contact email@example.com.