AIXTRON AG announced
the order of a 2-inch AIXTRON R+D CNT* system from the Chalmers University of
Technology, Sweden received in the fourth quarter of 2008. This combined thermal
CVD and plasma enhanced CVD tool is planned to be delivered in first quarter
2009 and will be used for the deposition of CNT for micro-coolers, through silicon
vias (TSV), sensors on CMOS and other nanotechnology based components.
Prof. Johan Liu, Chalmers University of Technology comments: “Our micro-cooler,
TSV, sensor and electronics applications require well controlled vertically
aligned CNT and AIXTRON’s CNT system is optimized exactly for this. AIXTRON
has a proven track record with its R&D CNT platform, which has not only
demonstrated reproducibility and reliability in the field, but also flexibility
for new process development.”
AIXTRON is a world leading supplier of Chemical Vapour Deposition (CVD), Atomic
Vapor Deposition (AVD) and Atomic Layer Deposition (ALD) equipment to the semiconductor
industry, with over 1,500 systems delivered to date. AIXTRON-Nanoinstruments
is focused on serving the Nanotechnology market through the manufacture of plasma
enhanced CVD systems for carbon nanotubes (CNT) and other nanomaterials. AIXTRON’s
nanotube and nanowire track record includes customers such as El-Mul Technologies,
Harvard University, Kansas State University, Massachusetts Institute of Technology,
Nanoconduction, Portland State University, Singapore Polytechnic, Santa Clara
University, UC San Diego, University of Tuebingen, and Yale University.
*CNT= Carbon NanoTubes