Brion, a division of ASML, and Cymer
Inc. (Nasdaq:CYMI) today announced the successful incorporation of detailed
Cymer laser spectral characteristics into Brion's computational lithography
models. Initial results show improvement in a significant portion of the model
accuracy budget. This is the first time that this level of laser bandwidth characterization
has been integrated into computational lithography products. The improved modeling
will enable semiconductor manufacturers to produce more advanced chips.
The work utilizes Cymer's factory-measured data, and underscores the
importance of laser bandwidth stabilization technology and tuning. The modeling
improvements to Brion's OPC RET series of products benefit customers by
increasing modeling accuracy. Brion's new LithoTuner series of products
for the fab are also enhanced with additional tuning flexibility.
"ASML and Cymer have a long history of successful partnerships,"
said Ed Brown, president and chief operating officer of Cymer, "Our work
with Brion extends those partnerships into computational lithography, allowing
information about our advanced light sources to be applied to photomask manufacturing.
We look forward to further collaborations in order to uncover new solutions
for lithography optimization."
"This helps our industry by allowing more accurate models and will be
embedded into all our computational lithography products by mid-year 2009,"
said Jim Koonmen, general manager at Brion. "At advanced semiconductor
nodes, every nanometer counts. This new level of accuracy will improve lithography
This collaboration shows ASML and Cymer's dedication to meeting advanced
semiconductor manufacturing requirements for continuously improving accuracy.
The results will be presented at the SPIE Advanced Lithography Conference on
Tuesday, February 24, 2009.