announced the sale of an advanced DWL 2000 maskless laser lithography system
to the MESA+ Institute for Nanotechnology, at the University of Twente, The
The DWL 2000 system will enable the user to expose sub micron structures on
photoresist, with an active write area of up to 200 mm by 200 mm.
"MESA+ (http://www.mesaplus.utwente.nl/) is one of the largest nanotechnology
research institutes in the world, delivering competitive and successful high
quality research. MESA+, Institute for Nanotechnology, is part of the University
of Twente, having intensive cooperation with various research groups within
the University. The University Twente is re-allocating the buildings for research
and education. In the centre of these buildings the new NanoLab will be build.
This NanoLab contains 1000 m2 cleanroom. NanoLab is the new research facility
of the MESA+ institute for NanoTechnology. With the investment in NanoLab the
university shows the interest for and the importance of Nanotechnology research.
The NanoLab will be built -next to cleanliness, temperature and humidity control-
with special floor constructions so there will be no vibration interference.
In order to support the research groups and start-up companies the DWL2000 will
be installed for research and device-prototyping." States Mr. Peter Linders,
Faculty of EEMCS, MESA+ Institute for Nanotechnology
Heidelberg Instruments, GmbH: With an installation base in over 30 countries,
Heidelberg Instruments is a world leader in production of high precision maskless
lithography systems. These systems are used for direct writing and photomask
production by some of the most prestigious universities and industry leaders
in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays,
Micro Optics, and many other related applications.