The Microfabrication Laboratory of the University of California at Berkeley,
a leading research institution studying microelectromechanical systems (MEMS)
and other electronic devices reports to be pleased with their Picosun
SUNALE(TM) R-150 atomic layer deposition (ALD) reactor, installed and in use
since late 2008.
"Picosun made a point in sending both an equipment and process specialist.
Our install was unique since we added additional custom hardware and the Picosun
team worked with my engineers to accommodate this special request. The install
time met Picosun’s estimate and the deposition tests were quickly within
specification", says Dr. Bill Flounders, Technology Manager of Berkeley
"Picosun and Berkeley Microfabrication Laboratory have signed a cooperative
research agreement which will benefit us both. We, as a leading ALD tool designer
and manufacturer, have identified working together with the leading research
institutions to form the basis of our technology and process development strategy",
says Juhana Kostamo, Managing Director of Picosun. "For Picosun, working
together with world class scientists at UC Berkeley is a privilege", Kostamo
"For us, the Picosun tool represented the best combination of cost and
capability. The SUNALE(TM) R-150 ALD reactor was qualified for Al2O3 deposition
with film deposition rate of 1.02 angstrom per cycle and 1 sigma non-uniformity
less than 1% across the wafer. Picosun technical support has been excellent
and I expect an ongoing constructive relationship that will benefit our lab
members and enhance Picosun’s position among US university research centres",
Dr. Flounders says.
At Berkeley Microfabrication Laboratory, Professor Clark Nguyen and his research
group are using ALD to coat micromechanical resonators so that the gaps between
their structures and electrodes can be reduced substantially. Reducing such
gaps to 10’s of nanometres helps to reduce the impedances of these devices
for wireless communication applications.
Professor Tsu-Jae King Liu and her research group use the SUNALE(TM) R-150
ALD tool to conformally deposit high-permittivity dielectric materials to precise
thicknesses, to enable new switching devices for integrated circuits that offer
better energy efficiency than conventional complementary metal–oxide–semiconductor
In 1960, Professors D. O. Pederson, T. E. Everhart, and P. L. Morton produced
plans for the world’s first university integrated circuit lab. This was
the beginning of today’s Berkeley Microfabrication Laboratory. Over the
years, membership of the laboratory has increased to over 500 presently. The
present Microlab is in its third decade and will continue operating until a
new laboratory is completed. The migration of the Microlab into the new Marvell
Nanolab will start this year.
Picosun develops and manufactures Atomic Layer Deposition (ALD) reactors for
micro- and nanotechnology applications. Picosun represents continuity to over
three decades of ALD reactor manufacturing in Finland. Picosun is based in Espoo,
Finland and has its US headquarters in Detroit, Michigan.
SUNALE(TM) ALD process tools are installed in various universities, research
institutes and companies across Europe, USA and Asia. Dr Tuomo Suntola, inventor
of ALD technology, is Member of the Board of Directors of Picosun. World’s
most experienced ALD reactor designer Sven Lindfors is Picosun´s Chief
Technology Officer and one of the founders of the company. Picosun Oy is a part
of Stephen Industries Inc Oy.