The NanoMaker Workbench software from SEMTech
Solutions automatically generates a Proximity Effect Corrected runfile,
compatible with NPGS systems, for SEM-based electron beam lithography.
The newly designed NanoMaker software has been successfully demonstrated at
the Nanoscale Integration Laboratory, University of Texas at Dallas. The hardware
platform included a Zeiss Supra 40 Field Emission Scanning Electron Microscope
(SEM) with a NPGS 9.2 pattern generator.
The experiment consisted of fabricating 20nm and 25nm lines with 50nm and 100nm
pitched arrays, respectively, separated by a large solid rectangle in the middle.
The HSQ resist thickness on Si was 180nm. Before using the NanoMaker Proximity
Effect Correction (PEC) software, many different doses were tried to fabricate
the structure correctly without success. Upon using the NanoMaker PEC software,
the optimal doses were automatically assigned, the data exported to the NPGS,
and the device was successfully fabricated.
“Usually, it is difficult to fabricate dense nanolines with higher aspect
ratios because of the proximity effect,” states Professor Walter Hu, of
the Nanoscale Integration Lab at UTD, “The preliminary NanoMaker results
that show its ability to get down to uniform 20nm lines in width with 50nm pitch
Scanning Electron Microscopes are typically limited in acceleration voltage
to 30kV. This is where proximity effects are dominant. For organizations that
need to create dense nano-patterns with a SEM, the NanoMaker design and PEC
software package adds tremendous value to existing NPGS systems.
“We are grateful to Professor Walter Hu and his team for allowing us
the opportunity to prove the power of the NanoMaker software,” states
Dr. Sergey Zaitsev, CTO of NanoMaker and Head of the Theoretical Department
at the Institute of Microelectronics Technology – Russian Academy of Sciences
(IMT RAS), “We look forward to a continued partnership with UTD and other
research institutes interested in electron/ion beam fabrication of nanodevices
and structures using the NanoMaker system.”
NanoMaker is a powerful software/hardware system for SEM/FIB based lithography
that is intended for state-of-the-art design and manufacturing of micro and
nano electronic devices and structures.