JEOL, a leading supplier
of electron microscopes for ultrahigh resolution imaging and analysis, will
demonstrate its new ultrahigh resolution, analytical Thermal Field Emission
Scanning Electron Microscope (SEM), the JSM-7600F, via live remote viewing and
control from Semicon West, San Francisco, July 14-16.
JEOL JSM-7600F Analytical FE SEM
The SEM will be remotely operated from JEOL's booth #606 to demonstrate ultrahigh
imaging resolution at up to 1,000,000X magnification, and X-ray analytical mapping
of individual layers, elemental composition, contaminants, particulates, and
process defects in semiconductor devices.
The only fully-analytical field emission SEM to feature a large chamber with
large specimen exchange airlock and LN2 anti-contaminator, the JSM-7600F accommodates
specimens up to 200mm in diameter, and features a highly stable 5-axis motor
drive eucentric stage that can be tilted from -5 to 70o.
The microscope's electron column produces the highest beam current available
on any FEG SEM, and provides superior imaging of nonconductive samples that
traditionally charge. The JSM-7600F minimizes beam damage on heat sensitive
samples, i.e. low-K dielectrics, and offers improved stability for unattended
data acquisition, particle analysis, EBSD, and X-ray mapping.
The JEOL JSM-7600F is fully outfitted for comprehensive analysis techniques
and can simultaneously view and acquire images and data from four different
types of imaging detectors. The SEM also does double duty as a direct write
e-beam lithography tool when outfitted with a high speed beam blanker and a
pattern generator (see previous release at www.jeolusa.com/NEWSEVENTS/PressReleases/tabid/314/newsid735/148/West-Virginia-University-Advancing-Nanoscience-with-New-E-beam-SEM/Default.aspx)