Site Sponsors
  • Strem Chemicals - Nanomaterials for R&D
  • Oxford Instruments Nanoanalysis - X-Max Large Area Analytical EDS SDD
  • Park Systems - Manufacturer of a complete range of AFM solutions
Posted in | Nanobusiness

STS Receives Order for Pegasus DRIE System from University of Michigan

Published on July 7, 2009 at 9:53 PM

Surface Technology Systems plc (STS), a leader in plasma process technologies for manufacturing MEMS and advanced semiconductor devices, today announced that they have sold a Pegasus DRIE system to the University of Michigan, Ann-Arbor. This will be installed alongside another Pegasus tool, purchased in 2008 and will be used for deep reactive ion etching (DRIE) of silicon for MEMS research.

The University is very highly regarded as one of the leading research institutes for their microtechnology research and have been using STS’ Advanced Silicon Etch (ASE®) DRIE technology since 1998.

Dr. Dennis Grimard, Managing Director of the University’s Lurie Nanofabrication Facility stated, "We have been using STS’ silicon etch equipment for over 10 years, and this capability has helped us remain at the forefront of research in micro- and nano- technology. We will use our tools as we continue to develop and fabricate new and innovative microdevices for a range of challenging applications, and provide world-class education for the engineers of tomorrow."

Eizo Yasui, CEO of STS replied, “We are very happy to have placed a second Pegasus tool at an internationally-renowned research facility such as the University of Michigan, and look forward to continuing our long and mutually beneficial relationship with them.”

Tell Us What You Think

Do you have a review, update or anything you would like to add to this news story?

Leave your feedback
Submit