Brion Technologies, a
division of ASML and an industry
leader in computational lithography for integrated circuits, has reached a preferred
supplier agreement with Toshiba Corporation to implement a comprehensive suite
of computational lithography products for Toshiba's 3X nm and 2X nm node
Brion's extensive portfolio of low k1 enabling products for immersion
scanner optimization will provide Toshiba substantial process window expansion
through the combination of Tachyon source mask optimization (SMO) and ASML's
(NASDAQ:ASML) (Amsterdam:ASML) freeform illumination shape capability. Brion
will also provide to Toshiba, Brion's Tachyon LMC and Tachyon OPC+ for
required resolution enhancement techniques. Together, these products enable
Toshiba to extend the use of immersion lithography to the 2X nm node.
Meeting the advanced imaging requirements of the 2X nm node will require the
effective use of increasingly complex RETs and/or Extreme Ultraviolet (EUV).
Brion will provide an entire portfolio of Tachyon computational lithography
products in order to select the best combination of techniques for each layer,
all while minimizing lithography costs.
"Brion's uniquely fast computational lithography technology consistently
gives optimum results across the areas of process development, mask design and
litho manufacturing," said Tatsuhiko Higashiki, Senior Manager of Toshiba's
Process & Manufacturing Engineering Center, Advanced ULSI Process Engineering
Bert Koek, senior vice president, Applications Product Group at ASML summarized:
"Working together with Toshiba, ASML and Brion can extend the traditional
boundaries between scanner optimization and computational lithography. In implementing
holistic lithography, Toshiba will continue with ArF immersion lithography in
a cost effective manner."
"We are excited to expand our relationship with Toshiba and to help them
advance their pioneering work in leading-edge semiconductors," said Jim
Koonmen, general manager of Brion. "In particular, we will work closely
with the Toshiba team to deploy our LithoTuner fab computational products and
demonstrate the ability to efficiently optimize each scanner in manufacturing
for individual designs."