Corporation (Nasdaq:CCMP), the world's leading supplier of chemical
mechanical planarization (CMP) polishing slurries and growing CMP pad supplier
to the semiconductor industry, announced today that its Epic D100 CMP polishing
pad has received Semiconductor International (SI) Magazine's "Editors'
Choice Best Products" award for 2009.
"The Editors' Choice Best Products awards program by SI acknowledges
products, materials and services that are proven in the manufacturing environment,"
said Laura Peters, Editor-in-Chief of Semiconductor International. SI's editors
evaluate the products based on feedback from customers in the field and only
the most highly recommended ones are honored each year.
William Noglows, Chairman and CEO of Cabot Microelectronics commented, "It
is an honor to receive this prestigious award from SI, which we believe reflects
our customers' satisfaction with the high performance of our Epic D100
polishing pad across a variety of commercial applications, as well as its compelling
cost of ownership. We look forward to expanding the adoption of our CMP pads
in the semiconductor industry through the continued execution of our key initiatives
of Technology Leadership, Operations Excellence, and Connecting with Customers."
The Epic D100 pad is based on proprietary material technology and a state-of-the-art
manufacturing process designed to improve pad performance, lower the cost of
ownership and provide superior quality. The Epic D100 has demonstrated significantly
longer pad life and lower overall defectivity than a conventional pad due to
its material characteristics. The design features a single polymer material
and is produced via a continuous single-sheet manufacturing process. This is
designed to eliminate batch-to-batch and pad-to-pad inconsistencies found in
a conventional pad. The Epic D100 can be customized to match customer grooving
requirements in facilities located in the United States and Asia. The Epic D100
pad is available for 200mm and 300mm wafer polishing, with or without a window
to detect the polishing end point. Cabot Microelectronics has intermediate pad
manufacturing capabilities to support approximately 30 percent of worldwide
customer demand for CMP pads. The materials and technology behind the Epic D100
CMP polishing pad are protected by an international portfolio of patents.
Cabot Microelectronics Corporation, headquartered in Aurora, Illinois, is the
world's leading supplier of CMP polishing slurries and growing CMP pad supplier
to the semiconductor industry. The company's products play a critical role in
the production of the most advanced semiconductor devices, enabling the manufacture
of smaller, faster and more complex devices by its customers. Since becoming
an independent public company in 2000, the company has grown to approximately
900 employees globally. The company's vision is to become the world leader in
shaping, enabling and enhancing the performance of surfaces, so the company
is leveraging its expertise in CMP slurry formulation, materials and polishing
techniques developed for the semiconductor industry and applying it to demanding
surface modification applications in other industries where shaping, enabling
and enhancing the performance of surfaces is critical to success. For more information
about Cabot Microelectronics Corporation, visit www.cabotcmp.com or contact
Amy Ford, Director of Investor Relations at (630) 499-2600.