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Cabot Epic D100 CMP Receives SI Magazine's "Editors' Choice Best Products" Award For 2009

Published on July 15, 2009 at 6:23 AM

Cabot Microelectronics Corporation (Nasdaq:CCMP), the world's leading supplier of chemical mechanical planarization (CMP) polishing slurries and growing CMP pad supplier to the semiconductor industry, announced today that its Epic D100 CMP polishing pad has received Semiconductor International (SI) Magazine's "Editors' Choice Best Products" award for 2009.

"The Editors' Choice Best Products awards program by SI acknowledges products, materials and services that are proven in the manufacturing environment," said Laura Peters, Editor-in-Chief of Semiconductor International. SI's editors evaluate the products based on feedback from customers in the field and only the most highly recommended ones are honored each year.

William Noglows, Chairman and CEO of Cabot Microelectronics commented, "It is an honor to receive this prestigious award from SI, which we believe reflects our customers' satisfaction with the high performance of our Epic D100 polishing pad across a variety of commercial applications, as well as its compelling cost of ownership. We look forward to expanding the adoption of our CMP pads in the semiconductor industry through the continued execution of our key initiatives of Technology Leadership, Operations Excellence, and Connecting with Customers."

The Epic D100 pad is based on proprietary material technology and a state-of-the-art manufacturing process designed to improve pad performance, lower the cost of ownership and provide superior quality. The Epic D100 has demonstrated significantly longer pad life and lower overall defectivity than a conventional pad due to its material characteristics. The design features a single polymer material and is produced via a continuous single-sheet manufacturing process. This is designed to eliminate batch-to-batch and pad-to-pad inconsistencies found in a conventional pad. The Epic D100 can be customized to match customer grooving requirements in facilities located in the United States and Asia. The Epic D100 pad is available for 200mm and 300mm wafer polishing, with or without a window to detect the polishing end point. Cabot Microelectronics has intermediate pad manufacturing capabilities to support approximately 30 percent of worldwide customer demand for CMP pads. The materials and technology behind the Epic D100 CMP polishing pad are protected by an international portfolio of patents.

Cabot Microelectronics Corporation, headquartered in Aurora, Illinois, is the world's leading supplier of CMP polishing slurries and growing CMP pad supplier to the semiconductor industry. The company's products play a critical role in the production of the most advanced semiconductor devices, enabling the manufacture of smaller, faster and more complex devices by its customers. Since becoming an independent public company in 2000, the company has grown to approximately 900 employees globally. The company's vision is to become the world leader in shaping, enabling and enhancing the performance of surfaces, so the company is leveraging its expertise in CMP slurry formulation, materials and polishing techniques developed for the semiconductor industry and applying it to demanding surface modification applications in other industries where shaping, enabling and enhancing the performance of surfaces is critical to success. For more information about Cabot Microelectronics Corporation, visit www.cabotcmp.com or contact Amy Ford, Director of Investor Relations at (630) 499-2600.

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