Nanonex Corporation,
the inventor and world's leading provider in nanoimprint lithography solutions
with the longest history, announces the purchase of a Nanonex NX-2600 by University
of Massachusetts Lowell. Nanonex is proud to support the leading edge research
at the University of Massachusetts Lowell.
The NX-2600 tool was purchased by Prof. Hongwei Sun and his colleagues at University
of Massachusetts at Lowell (UML). The NX-2600 will be used as a tool for nanomanufacturing
and nano/micro fabrication at UML in the cutting edge research of nanostructure-based
chemical and biological sensors, nanoelectronics, nanophotonics, solar cells,
MEMS and template-based nanomanufacturing.
On November 5th 2009, Nanonex was invited by University of Massachusetts Lowell
to introduce its low-cost, high-throughput, large-area patterning of 3D nanostructures
with sub-10 nm resolution and accurate overlay alignment nanoimprint lithography
(NIL) solution. The seminar introduced various forms of nanoimprinting, such
as thermoplastic, ultraviolet-curable, thermal-curable, and direct imprinting
(embossing). The NX imprint tool can be used to meet the needs of a broad spectrum
of markets, such as optical devices, displays, data storage, biotech, semiconductor
integrated circuits, chemical synthesis, and advanced materials. Nanonex also
introduced its current research in laser assisted direct imprint (LADI). This
technology is capable of direct "print" nanopatterns, planarizing
rough surface and fill nanotrenches of hard materials through laser melting
and imprinting. This project is partially supported by NIST-APT program.
Nanonex is the inventor of “nanoimprint lithography”, the world’s
first nanoimprint lithography company, and the world’s leading provider
of nanoimprint solutions that include equipment, masks, resists and processes.
Nanonex’s patented and proprietary nanoimprint lithography (NIL) solutions
and Air-Cushion PressTM can manufacture 3D nanostructures with sub-5 nm resolution,
large-area uniformity, accurate overlay alignment, high throughput, and low
cost. Nanonex NIL solutions have been adopted by a broad spectrum of industry
applications, such as optical devices, data storage, displays, light emitting
diodes, semiconductor ICs, biotech, chemical synthesis, and advanced materials.
Nanonex has over 100 customers and an installed base of more than 40 tools world-wide.