Heidelberg Instruments announced
the sale of an advanced DWL 2000 maskless laser lithography system to the Cornell
NanoScale Science and Technology Facility, located in Ithaca, New York.
The DWL 2000 system will enable the user to expose sub micron structures on
photoresist, with an active write area of up to 200 mm by 200 mm.
“CNF has a long history of providing in-house mask making capability
to facility users at an affordable cost. This allows rapid cycle time from concept
to prototype. CNF has recently installed a modern DUV (248nm) stepper that requires
0.7 µm features at the mask. The current tools render mask production
too slow to meet this new requirement, creating an economic barrier to using
the DUV system. The new DWL 2000 system from Heidelberg Instruments combines
the large high speed scanning field with high resolution optics and stage precision
that recovers the low cost structure for in-house mask fabrication.” states
Don Tennant, Director of Operations at the Cornell NanoScale Science and Technology
About Cornell NanoScale Science and Technology Facility: The Cornell NanoScale
Science & Technology Facility (CNF) is a national user facility that supports
a broad range of nanoscale science and technology projects by providing state-of-the-art
resources coupled with expert staff support. 2007 marked its 30th year in operation.
Research at CNF encompasses physical sciences, engineering, and life sciences,
and has a strong inter-disciplinary emphasis. Over 700 users per year (50% of
whom come from outside Cornell) use the fabrication, synthesis, computation,
characterization, and integration resources of CNF to build structures, devices,
and systems from atomic to complex length-scales.
About Heidelberg Instruments, GmbH: With an installation base in over 30 countries,
Heidelberg Instruments is a world leader in production of high precision maskless
lithography systems. These systems are used for direct writing and photomask
production by some of the most prestigious universities and industry leaders
in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays,
Micro Optics, and many other related applications.