Oy, Finland-based global manufacturer of state-of-the-art Atomic Layer Deposition
(ALD) systems launched today a 200 mm batch production version of its highly
praised design of SUNALE ALD process tools. The new SUNALE P200B
system comes with a large variety of configurations and is able to process up
to hundreds of silicon wafers per day. P200B can also process 3D objects with
“The SUNALE family of ALD reactors has been extremely successful
in advanced scientific research and R&D,” says Juhana Kostamo, Managing
Director of Picosun.”Our production customers have thus far registered
excellent results with Picosun’s P100B production reactor system, but
the introduction of the P200B will revolutionize the capabilities we can offer
to industries” he says.
“During the 30+ years of ALD history, people working today for Picosun
have designed and produced 15 generations of ALD systems. Picosun’s ancestry
in ALD is completely beyond comparison, and it shows in the superior usability
and reliability of our products and the terrific quality of results obtained
using them”, Kostamo says.
The man who invented and patented the method of ALD in 1975, Dr. Tuomo Suntola,
continues to serve as a member of the board of directors of Picosun. Globally
by far the most experienced designer of ALD reactors, Mr Sven Lindfors, is CTO
of Picosun. Combined, Picosun people possess well over 200 years of first-hand
ALD experience and have been instrumental in producing over 100 patents on the
science and technique of ALD.
“Despite launching the new P200B only today, we already have several
customers evaluating it for their advanced ALD production purposes”, Juhana
SUNALE ALD process tools are well known for the fact that their genial
generic design allows results of research to be turned into production use.
Usually, when promising laboratory results are being transformed to meet production
requirements, the all too common technology gap between the two layers of practise
delay or even prevent success in transferring singular success into HVM production.
The P200B is yet another demonstration of Picosun’s ability to convincingly
bypass these perils.
Picosun develops and manufactures Atomic Layer Deposition ( ALD) reactors
for micro- and nanotechnology applications. Picosun represents continuity to
over three decades of ALD reactor manufacturing in Finland. Picosun is based
in Espoo, Finland with production, R&D and laboratory facilities in Kirkkonummi,
Finland and has its US headquarters in Detroit, Michigan. SUNALE ALD
process tools are installed in various universities, research institutes and
companies across Europe, USA and Asia. Picosun Oy is a part of Stephen Industries