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Heidelberg Announces Sale of Maskless Laser Lithography System to Regensburg University

Published on December 18, 2009 at 6:51 AM

Heidelberg Instruments announced the sale of an advanced DWL 66FS maskless laser lithography system to the Regensburg University of Applied Sciences, Regensburg, Germany.

The DWL 66FS maskless lithography system is capable of binary and gray scale exposure, layer to layer alignment, and is able to produce sub micron features.

“The new laboratory for microsystems technology at the Regensburg University of Applied Sciences includes a 100 m² clean room, which is utilized in part by the group for micro sensor technology. The clean room is used for educational purposes as well as a variety of research and development projects in the field of sensor technology and analytics. These applications require not only state of the art photomasks but there is also an increasing demand for 3-dimensional surface structures. These structures could not be realized with the existing equipment and the new Heidelberg Instruments laser lithography system will now enable us to close this gap.” states Prof. Dr. R. Schreiner, head of the laboratory for micro sensor technology.

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