Oy, Finland-based global manufacturer of state-of-the-art Atomic Layer Deposition
(ALD) systems today announced having sold a Picosun SUNALE™ R-100 reactor
to Finnish Aalto University to modernize its fleet of ALD reactors.
"I am extremely proud that one of the most experienced ALD research
teams in the world has decided to partner with Picosun. Formerly known as the
Helsinki University of Technology, now part of the new Aalto university, they
shoulder the responsibility to foster a whole new generation of scientists to
use and develop ALD technology," says Juhana Kostamo, Managing Director
"We are, for our part, ready to prove ourselves worthy of this trust.
I am convinced that their new Picosun SUNALE™ reactor will facilitate
the breaking of new ground in the science of ALD and thus help the whole science
community to take further steps towards yet more exiting discoveries,"
The Laboratory of Inorganic Chemistry (LIC) at the Department of Chemistry,
Aalto University School of Science and Technology, is one of the long-term actors
in the field of ALD technology. The ALD technique has been extensively employed
in the laboratory since the early 1980s, first to deposit electroluminescent
sulphide thin films, etc., and during the past 15 years or so to develop processes
for a variety of oxide thin films including high-k dielectrics.
Currently the LIC thin-film group consists of 8-10 persons, while the
total number of laboratory personnel counts some 25 to 30 persons. Besides the
ALD research, the laboratory is also world-wide recognized for its pioneering
research on completely new functional oxide materials, designing and on-demand
tailoring novel material candidates for applications such as superconductors,
spintronics, thermoelectric, solid oxide fuel cells (SOFC) and Li-Ion batteries.
"Our thin-film research aims at a complete chain of steps starting from
the precursor synthesis and ending with thin film characterization and applications.
For many years the main challenge was to fabricate high-quality thin films of
high-k dielectric materials," says Professor Maarit Karppinen, renowned
for her almost alchemistic pioneering work in developing new materials.
"Currently the frontier of our ALD research is more and more shifting
from the simple oxides towards more complex oxide materials with exciting functional
(magnetic, ferroelectric, thermoelectric, etc.) properties, organic and inorganic/organic
hybrid materials as well as inorganic coatings on various functional substrate
materials such as polymers, biomaterials, carbon nanotubes, graphene sheets,
In January 2010, a Picosun SUNALE™ R-100 research reactor was delivered
to the LIC laboratory. With the addition of a new reactor to the crew, the laboratory
is now housing four ALD tools altogether. "An ALD reactor from Picosun
was chosen due to its versatility, possibility to effectively deposit on porous
substrates and better temperature control compared to the older three ALD units.
The new reactor will primarily be used for new complex processes to make use
of its better controllability," states professor Karppinen.
Picosun develops and manufactures Atomic Layer Deposition (ALD) reactors for
micro- and nanotechnology applications. Picosun represents continuity to over
three decades of ALD reactor manufacturing in Finland. Picosun is based in Espoo,
Finland and has its US headquarters in Detroit, Michigan. SUNALE™ ALD
process tools are installed in various universities, research institutes and
companies across Europe, USA and Asia.
Dr. Tuomo Suntola, inventor of ALD technology, is Member of the Board of Directors
of Picosun. World's most experienced ALD reactor designer Sven Lindfors
is Picosun's Chief Technology Officer and founder of the company. Picosun
Oy is a part of Stephen Industries Inc Oy.