Transmission diffraction gratings are required in many research and development projects such as characterization of EUV light sources or spectroscopy experiments in the EUV range.
Because of high absorption by all materials in this spectral range (roughly 5-20 nm) the gratings must be made on thin membranes and the slits should have negligible absorption. Having long-standing experience in the fabrication of EUV transmission gratings Eulitha is now offering deep etched gratings for spectroscopy applications.
SEM image of a 1mm period grating etched into a silicon nitride membrane. The cross section of this grating is shown in the inset.
The gratings are designed according to customer specifications, e.g. size, linewidth and grating pitch. The mechanical stability and durability of the membranes are ensured by an extremely thin (ca. 20nm) layer of silicon nitride left unetched in the slits and a crossbar structure. Our mature processes and expertise in processing the extremely fragile membranes enables us to offer high-quality gratings at affordable prices.
Eulitha is a pioneer and leader in production of high-quality nanostructures using advanced lithography techniques. We offer custom-made and standardized nanostructures with resolution extending down to sub-20 nm region.
Eulitha's fabrication for periodic nanostructures is based on its record-breaking Extreme Ultraviolet Interference lithography EUV-IL technology. The method uses light at a wavelength of about 13 nm. Eulitha fabricates one-dimensional linear gratings and two-dimensional dot arrays or grids by EUV-IL
Source: Eulitha