Picosun Oy, Finland-based global manufacturer of state-of-the-art Atomic Layer Deposition (ALD) systems, together with Fudan University, Picosun’s Chinese distributor Beijing Honoprof, Shanghai Institute of Technical Physics of the Chinese Academy of Sciences, Nanjing University, and National Engineering Research Center for Nanotechnology organized the very first scientific ALD meeting ever held in China on Monday and Tuesday at the Lansheng hotel in Shanghai.
The 1st ALD Scientific Meeting 2010 China was dedicated to the science and technology of ALD providing a forum for ALD specialists and ALD users from different locations in China to meet and exchange ideas. A large number of Chinese ALD experts used the opportunity to discuss recent advances of ALD research and application.
Professor Wei Zhang of Fudan University, Chairman of the Organizing Committee of the Meeting opened the event by emphasizing the importance of having, for the first time, the Chinese ALD-community gathered together to explore the future of the technology.
“This meeting intends to serve as a predecessor for future China ALD conferences, creates a scientific community for nationwide and international collaboration, as well as advances China’s ALD research activity,” says Dr. Wei-Min Li, Application Director of Picosun and co-chair of the scientific meeting. “Picosun is extremely happy to be able to facilitate this event, together with its Chinese partners,” says Juhana Kostamo, Managing Director of Picosun.
The opening key note presentation of the meeting was anticipated with great interest. For the first time, the Chinese ALD community had the possibility to hear directly from the man who, back in 1974, invented ALD: Dr. Tuomo Suntola, member of the Board of Directors of Picosun. The title of his one-hour presentation, “ALD for Advanced Semiconductor and Nanotechnology Manufacturing” could not have been more topical since ALD is finally breaking into the realm of manufacturing on a very broad front.
Participants also heard Professor Mikko Ritala, one of the most prominent ALD scientists on the global scene reveal the latest in ALD precursor chemistry. Professors Xin Chen of Shanghai Institute of Technical Physics, Yigang Yang of Tsinghua University, Hongtao Wang of Zhejiang University, Honxia Liu of Xidiang University, Aidong Li of Nanjing University, and Shijin Ding of Fudan University contributed with a wide range of scientific presentations and moderation of lively discussions.
On Tuesday Picosun’s Managing Director, Juhana Kostamo and Application Director, Dr. Wei-Min Li painted a picture of the global ALD scene, and explained how Picosun has managed to bridge research and production with its inspired array of ALD systems. Participants were able to cap the meeting with a stimulating tour of the Shanghai Institute of Technical Physics ALD laboratory facilities, equipped with Picosun SUNALE™ ALD systems.
“China is a very important market for Picosun, and Picosun has established a leading position in the Chinese ALD tool market. Having witnessed the enthusiasm with which Chinese scientists are embracing the possibility to act as trailblazers introducing ALD into their applications and the technology tool chest of the fastest growing economy in the world is extremely promising,” Juhana Kostamo says.