Jordan Valley Semiconductors, a company that delivers X-ray metrology solutions for advanced semiconductor fabrication plants, declared the supply of its JVX6200 and JVX7200 thin-film metrology systems to a key foundry in the Far East.
The JVX7200 metrology platform is mounted in many advanced logic fabs aimed at complex Si:C and SiGe metrology for production control as well as R&D. This platform integrates two absolute measurement methods namely fast HRXRD, which is a high-resolution x-ray diffraction method, and fast XRR, which is an X-Ray reflectance method.
The JVX7200's "VEGA" XRR channel was introduced recently and allows on-product measurement with increased accuracy and repeatability. The JVX6200 metrology platform integrates XRF and XRR channels to suit applications such as ONO, high-k/metal gate silicide, SiON, Cu seed/barriers, and others.
The JVX7200 metrology system can be used to measure SiGe thickness, composition, strain, density, and relaxation of single as well as multi-layer stacks. The JVX7200 works well on product wafers offering accuracy, high throughput, and repeatability. XRR and HRXRD are key methods to produce accurate results without calibration.
The JVX6200i metrology system is a high uptime, high throughput and low COO production tool that can be used for advanced semiconductor BEOL and FEOL processes and wafer-level packaging (WLP) applications.
Source: http://www.jvsemi.com/