Picosun Oy, Finland-based global manufacturer of state-of-the-art Atomic Layer Deposition (ALD) equipment, has again proven its unparalleled expertise in ALD reactor design and manufacturing.
Record particle levels, only 1-2 added particles (> 70 nm) per wafer have been obtained with the PICOSUN P-300B ALD batch tool installed at Fraunhofer Institute for Photonic Microsystems (Fraunhofer IPMS) in the center of European IC manufacturing industry in Dresden, Germany. Also record-level process repeatability and film non-uniformity, down to 0.13 % 1ó for the best wafer, were achieved.
The process purity requirements in semiconductor and integrated circuit industries are the strictest in the world, and these results obtained with Picosun's ALD reactor construction set completely new standards to the whole ALD equipment industry when it comes to process quality.
Based on modern equipment in state-of-the-art clean room facilities Fraunhofer IPMS offers complete service in developing technologies for MEMS & MOEMS. Services range from feasibility studies to the development of complete production technologies and pilot-fabrication, including characterization, qualification and foundry services for individual steps in the process or for technology modules.
"We have been extremely pleased with Picosun's fast tool delivery and installation and the excellent tool quality. With its efficient wafer batch process Picosun meets our strict defect density requirements," states Dr. Tom Richter from Fraunhofer IPMS.
Picosun Oy is a Finland-based global manufacturer of ALD systems, representing continuity to almost four decades of dedicated, exclusive ALD reactor design and manufacturing. Picosun's global headquarters are located in Espoo, Finland, its production facilities in Masala, Kirkkonummi, its US headquarters in Detroit, Michigan, and its first Asian subsidiary Picosun Asia Pte. Ltd. has recently been established in Singapore. PICOSUN ALD tools are chosen for production by various industries across four continents.