More than 50 participants from industry, universities, and scientific institutions participated in SENTECH’s seminar “Plasma Process Technology” on February 28, 2013, in Berlin, Germany. The Seminar focused on issues of topical interest, including GaN processing, silicon nanostructuring, low temperature deposition of SiN, graphene components, and ALD barrier layers.
Group picture at SENTECH's Plasma Seminar
One special highlight was a report on the deposition of low hydrogen concentration SiN films at 130°C which proved to exhibit characteristics ideal for GaN HEMT gate material. The presentations were held by highly qualified speakers from partner institutions like Fraunhofer IAF Freiburg, FBH Berlin, IHP Frankfurt/Oder, FSU IAP Jena, TU Ilmenau, and TU Braunschweig as well as by SENTECH experts.
Another highlight of the seminar was the visit to SENTECH’s manufacturing facilities and well-equipped application laboratories for plasma process technology and thin film measurement. The seminar received very positive ratings and will be continued with up-to-date topics in 2014. The attached picture shows participants of the seminar in front of the SENTECH Instruments company building in Berlin.
SENTECH Instruments is a worldwide leader in thin film measurement and plasma process technology equipment. SENTECH develops, manufactures, and sells advanced plasma etch- and deposition systems based on its proprietary PTSA-ICP plasma source. The systems offer low damage, high rate, and low temperature processing for device manufacturing and R&D. SENTECHs latest innovation were made in the field of ALD and PEALD.