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Jordan Valley Obtained Repeat Order for ThinFilm Metrology System from Asian Foundry

Published on July 9, 2013 at 5:12 AM

Jordan Valley, a leading supplier of X-ray based in-line metrology systems for advanced semiconductor manufacturers, today announced that it received repeat order for its new JVX7300HR front-end-of-line strain & thin films metrology system from a leading foundry in Asia.

The JVX7300HR system provides in-line, first principle metrology solution for advanced epi. (SiGe, Si:C, strain, FinFET) and HKMG (HfO, TiN, TaN) stack analysis for 20 nm (nanometer) and below technology nodes. The JVX7300HR supersedes the JVX7200HR (Best-of-West 2010 award winner) with added capabilities and significant productivity improvements. The company noted that the systems were ordered after successful evaluation of the technology in multiple production sites last year.

Isaac Mazor, Jordan Valley's CEO said: "We are pleased to have been selected by our long-standing customer to support their sub 20nm node FEOL process metrology. This selection represents the customer's confidence in Jordan Valley's ability to provide valuable metrology solution for their demanding applications, trusting the first-principle, X-ray based metrology to provide process control that is superior to the traditional optical metrology"

Mazor added: "Advanced technology nodes set new metrology challenges and requirements for advanced process elements such as epi and high-k/metal gate stacks used to enhance the performance of planar and FinFET transistors. The new tool and methodologies developed by Jordan Valley's R&D team, provides new capabilities, including XRR / HRXRD hybrid metrology, as well as significantly improved productivity, measuring on patterned wafers, meeting our customer's stringent process, application and throughput requirements."

By choosing the JVX7300HR platform, the customer acknowledged the product robustness, performance and extendibility to future technology nodes. We believe that the JVX7300HR can be a strong contributor to assure high yield in the current and next generation process nodes, especially for logic and foundry players. Concluded Isaac Mazor.

Source: http://www.jvsemi.com

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