Research and Markets has announced the addition of the "Global Atomic Layer Deposition Market 2014-2018" report to their offering.
The analysts forecast the Global Atomic Layer Deposition market to grow at a CAGR of 36.10 percent over the period 2013-2018. One of the key factors contributing to this market growth is the growing demand for miniaturized components. The Global Atomic Layer Deposition market has also been witnessing the development of new atomic layer deposition materials. However, the slow deposition rate of atomic layer deposition could pose a challenge to the growth of this market.
Key vendors dominating this space include Adeka Corp., Applied Materials Inc., and ASM International N.V.
Other vendors mentioned in the report are Air Liquide S.A., Air Products and Chemicals Inc., AIXTRON SE, Arradiance Inc., ATMI Inc., Beneq Oy, Centrotherm Photovoltaics AG, Encapsulix SAS, Hitachi Kokusai Electric Inc., Kurt J. Lesker Co., Levitech BV, NCD Co. Ltd., Nova-Kem LLC., Oxford Instruments plc, Picosun Oy, Praxair Technology Inc., SENTECH Instruments GmbH, SoLayTec, Strem Chemicals Inc., SVT Associates Inc., Tokyo Electron Ltd., Tosoh Corp., Ultratech Inc., and Veeco Instruments Inc.
Commenting on the report, an analyst from the team said: Development of new ALD materials is one of the major trends in the Global ALD market. The development of new ALD materials is expected to occur in the near future as several ALD material manufacturers are investing a huge amount to develop new ALD materials across the globe. In the last few years, the market has witnessed the introduction of some new materials such as Porous SiOC, AlO, Hf(Si)O, ZrO, LaO, and SiC by the vendors. The development of several new ALD materials is required for the in-depth understanding of growth of thin deposition layers and nanostructures to both inorganic and organic surfaces.
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