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Entegris Sets New Standard for Nanoparticle Contamination Control in Wet Etching of Semiconductors

Published on July 19, 2007 at 1:20 AM

Entegris is setting the new standard for liquid contamination control of nano-scale particles in wet etch and clean (WEC) manufacturing processes used in advanced semiconductor applications with the launch of its Torrento™ family of high-flow liquid filters. The new membrane technology provides users exceptional flow performance without compromising retention at a 20 nm pore size rating. Torrento filters also feature Entegris' industry-standard, nondewetting surface technology for use in a high-flow recirculated bath with aggressive aqueous chemistries.

"Contamination control becomes increasingly more difficult as semiconductor manufacturers drive their sub-45 nm technology applications," said Chad Ruwe, Entegris vice president, Liquid Microcontamination business. "With the Torrento high-flux platform of WEC filter products, Entegris has built on its proven expertise in membrane and filtration technology to help fabrication facilities improve yields, while maintaining the lowest cost of ownership without sacrificing contamination control."

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